Influence of polymer phase separation on roughness of resist features
Influence of polymer phase separation on roughness of resist features
复制标题
聚合物相分离对抗蚀剂特征粗糙度的影响
DOI：
10.1116/1.1651106
复制
发表时间：
2004
影响因子：
1.4
通讯作者：
H. Ahmed
中科院分区：
文献类型：
--
作者：
S. Yasin;D. Hasko;M. Khalid;D. Weaver;H. Ahmed
使用原子力显微镜研究了聚（甲基丙烯酸甲酯）抗蚀剂特征的粗糙度对显影剂成分和显影时间的依赖性，使用甲基异丁基酮：丙醇（MIBK：IPA）显影剂，有或没有超声波辅助。研究发现，粗糙度随着显影剂中 MIBK 比例的增加而降低，对于弱显影剂（1:4 MIBK:IPA，25°C），粗糙度随着显影时间的增加而增加。研究还发现，使用弱显影剂时，超声波辅助显影可降低粗糙度，但使用强显影剂 (1:1 MIBK:IPA) 或使用 3:7 水:IPA 时，没有显着效果。我们认为粗糙度的根源是由于弱溶剂中显影过程中的相分离以及长时间的显影造成的。
The dependence of roughness of poly(methylmethacrylate) resist features on developer composition and development time, using methyl isobutyl ketone:propanol (MIBK:IPA) developer with and without ultrasonic assistance, is investigated using atomic force microscopy. It is found that the roughness decreases with increasing proportion of MIBK in the developer and that for a weak developer (1:4 MIBK:IPA at 25 °C), the roughness increases with development time. Ultrasonically assisted development is also found to reduce the roughness when using a weak developer, but has no significant effect with a strong developer (1:1 MIBK:IPA), or when using 3:7 water:IPA. We propose that the origin of the roughness is due to phase separation during development in weak solvents and for long development times.