0 60 90 63 v 1 8 S ep 2 00 6 Electron interferometry with nano-gratings
0 60 90 63 v 1 8 S ep 2 00 6 Electron interferometry with nano-gratings
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0 60 90 63 v 1 8 Sep 2 00 6 纳米光栅电子干涉测量
DOI：
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发表时间：
2006
期刊：
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通讯作者：
B. McMorran
中科院分区：
文献类型：
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作者：
A. Cronin;B. McMorran
提出了一种基于两个纳米结构光栅近场衍射的电子干涉仪。用成像探测器观察条纹，当光栅之间的距离从0增加到3mm时，条纹可见性就会恢复。这证实了经过纳米结构衍射的电子束在超过塔尔博特长度zT = 2d/λ = 1.2 mm后仍然保持相干，从而证明了塔尔博特-劳干涉仪对电子的作用原理。由相位物体引起的畸变条纹证明了这种新型电子干涉仪的应用。
We present an electron interferometer based on near-field diffraction from two nanostructure gratings. Lau fringes are observed with an imaging detector, and revivals in the fringe visibility occur as the separation between gratings is increased from 0 to 3 mm. This verifies that electron beams diffracted by nanostructures remain coherent after propagating farther than the Talbot length zT = 2d/λ = 1.2 mm, and hence is a proof of principle for the function of a Talbot-Lau interferometer for electrons. Distorted fringes due to a phase object demonstrates an application for this new type of electron interferometer.