Electrochemical-Etching Approach to Achieving Ultrathin FeSe Films
Electrochemical-Etching Approach to Achieving Ultrathin FeSe Films
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DOI:
10.1380/jsssj.37.541
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发表时间:
2016
期刊:
影响因子:
--
通讯作者:
J. Shiogai;T. Nojima;A. Tsukazaki
中科院分区:
文献类型:
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作者:
J. Shiogai;T. Nojima;A. Tsukazaki
Electric double layer transistor (EDLT) has attracted attentions over the decade as a useful tool to induce and control fascinating many physical properties at two dimensional (2D) materials surface based on its giant capacitance. This paper highlights another aspect of EDLT : electrochemical reaction as a method to achieve ultrathin films. Precise tuning of reactivity of electrochemical etching between ionic liquid and solid surface makes it possible to peel off 2D materials layer-by-layer. This technique was applied to an iron-based superconductor FeSe in EDLT towards the observation of high temperature superconductivity in ultra-thin film form.