Control of the structure in zone-melted silicon films on amorphous substrates
Control of the structure in zone-melted silicon films on amorphous substrates
复制标题
非晶衬底上区域熔化硅薄膜的结构控制
DOI：
10.1016/0167-577x(83)90044-7
复制
发表时间：
1983
影响因子：
3
通讯作者：
E. I. Givargizov
中科院分区：
文献类型：
--
作者：
A. Limanov;E. I. Givargizov
本文描述了激光在非晶基底上对硅薄膜进行区熔再结晶过程中结晶前沿（固液界面）的现场观测。研究了前面的细胞结构，并注意到从多面到圆形的过渡取决于薄膜的厚度。
In situ observations of a crystallization front (solid-liquid interface) during zone-melting recrystallization of thin silicon films on amorphous substrates by laser beams are described. Cellular structure of the front is investigated, and a transition from faceted to rounded front depending on thickness of the film is noted.