Development and Repetitive-Compensated PID Control of a Nanopositioning Stage With Large-Stroke and Decoupling Property
Development and Repetitive-Compensated PID Control of a Nanopositioning Stage With Large-Stroke and Decoupling Property
复制标题
大行程解耦纳米定位台的研制及重复补偿PID控制
DOI：
10.1109/tie.2017.2758749
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发表时间：
2018-05-01
影响因子：
7.7
通讯作者：
Li, Yangmin
中科院分区：
文献类型：
--
作者：
Tang, Hui;Gao, Jian;Li, Yangmin
压电驱动的纳米定位平台，具有大行程和低串扰，是非常有吸引力的完成通过硅光刻蚀刻任务。本论文的动机是将纳米定位工作台的工作空间和定位精度联合收割机结合起来，使其能够以毫米级的工作空间和纳米级的定位精度运行。采用两对具有高位移放大比的柔性导向运动模块构成4-PP（P为棱柱）XY纳米定位工作台。提出了一种新的解耦设计方法，实现了输入驱动器和输出柔性臂之间的解耦。进行了包括输出柔度、输入刚度、位移放大率建模和工作空间确定在内的运动学建模。利用粒子群优化算法对机构尺寸进行了一系列优化，并利用ANSYS工作台对优化后的机构性能进行了分析和评价。设计了重复补偿PID控制器和单输入单输出闭环控制策略。最后，对系统进行了串扰测试、频率特性分析、阻尼特性分析、动态迟滞非线性表征、信号轨迹跟踪、工作空间确定、Bode图绘制等一系列实验测试。实验结果表明，样机的工作空间达到1.035mm × 1.035mm，串扰率小于0.5%，闭环定位精度为400 nm。
Piezoelectric-actuator-driven nanopositioning stages, with large stroke and low crosstalk, are quite appealing for fulfilling the through-silicon via lithography etching task. The motivation of this paper is to combine the ability to enable the nanopositioning stage running in a manner of millimeter scale workspace and nanometer scale positioning accuracy. Two pairs of flexure-guided kinematic modules with high displacement amplification ratio are adopted to construct a 4-PP (P is prismatic) XY nanopositioning stage. A new decoupling design is implemented to realize the decoupling behavior between the input actuators and output compliant limbs, respectively. Kinematics modeling including output compliance, input stiffness, displacement amplification ratio modeling, and workspace determination are carried out. After a series of mechanism dimension optimizations via particle swarm optimization algorithm, the performance of the optimized mechanism is analyzed and assessed by using the ANSYS workbench. Then, a repetitive-compensated PID controller and a single-input and single-output closed-loop control strategy are designed. Finally, a series of experimental tests in terms of crosstalk test, frequency characteristic analysis, damping property analysis, dynamic hysteresis nonlinearity characterization, signal trajectory tracking, workspace determination, and Bode diagram plotting are carried out in details. It indicates that the workspace of fabricated prototype has reached to 1.035 mm $\times$ 1.035 mm, the crosstalk ratio is kept within 0.5%, and the closed-loop positioning accuracy is determined as 400 nm.