Structural and gasochromic properties of WO3 films prepared by reactive sputtering deposition
Structural and gasochromic properties of WO3 films prepared by reactive sputtering deposition
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DOI：
10.1088/2053-1591/2/2/026401
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发表时间：
2015-02
影响因子：
2.3
通讯作者：
S. Yamamoto;T. Hakoda;A. Miyashita;M. Yoshikawa
中科院分区：
文献类型：
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作者：
S. Yamamoto;T. Hakoda;A. Miyashita;M. Yoshikawa
研究了沉积温度和薄膜厚度对用于环己烷气体光学检测的三氧化钨（WO 3）薄膜结构和气致变色性能的影响。采用磁控溅射法在SiO2衬底上制备了WO 3薄膜，沉积温度为300 ~ 550 °C。采用扫描电子显微镜（SEM）、X射线衍射（XRD）和卢瑟福背散射光谱（RBS）对薄膜进行了表征。的WO 3薄膜，涂覆有催化Pt层的气致变色性能，通过将它们暴露到高达5%的环己烷在N2气体中进行检查。结果表明，在400 ~ 450 °C的沉积温度下，生长出了具有柱状结构的（001）取向单斜晶WO 3薄膜。此外，（010）取向的WO 3膜优选在高于500 ℃的沉积温度下形成。Pt/WO 3薄膜的气致变色特性表明，（001）取向的WO 3薄膜，具有菜花状的表面形貌，是合适的环己烷气体的光学检测。
The effects of deposition temperature and film thickness on the structural and gasochromic properties of tungsten trioxide (WO3) films used for the optical detection of diluted cyclohexane gas have been investigated. The WO3 films were prepared on SiO2 substrates by magnetron sputtering, with the deposition temperature ranging from 300 to 550 °C in an Ar and O2 gas mixture. The films were characterized by scanning electron microscopy (SEM), x-ray diffraction (XRD), and Rutherford backscattering spectroscopy (RBS). The gasochromic properties of the WO3 films, coated with a catalytic Pt layer, were examined by exposing them to up to 5% cyclohexane in N2 gas. It was found that (001)-oriented monoclinic WO3 films, with a columnar structure, grew at deposition temperatures between 400 and 450 °C. Furthermore, (010)-oriented WO3 films were preferably formed at deposition temperatures higher than 500 °C. The gasochromic characterization of the Pt/WO3 films revealed that (001)-oriented WO3 films, with cauliflower-like surface morphology, were appropriate for the optical detection of cyclohexane gas.