Observation of negative differential resistance and single-electron tunneling in electromigrated break junctions

Observation of negative differential resistance and single-electron tunneling in electromigrated break junctions
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电迁移断裂结中负微分电阻和单电子隧道效应的观察

DOI:
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发表时间:
2008
期刊:
Thin Solid Films 516
影响因子:
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通讯作者:
and T.Nagase
and T.Nagase
中科院分区:
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文献类型:
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作者:
Y.Noguchi;R.Ueda;T.Kubota;T Kamikado;S.Yokoyama;and T.Nagase

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