Large-Area Resonance-Tuned Metasurfaces for On-Demand Enhanced Spectroscopy
Large-Area Resonance-Tuned Metasurfaces for On-Demand Enhanced Spectroscopy
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DOI：
10.1155/2015/507656
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发表时间：
2015-01-01
影响因子：
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通讯作者：
Sakoda, Kazuaki
中科院分区：
文献类型：
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作者：
Iwanaga, Masanobu;Choi, Bongseok;Sakoda, Kazuaki
我们展示了一个有效的程序，横向结构调整纳米压印光刻（NIL），已开发为一个垂直的自上而下的方法制造大面积纳米片。该程序被施加到堆叠的互补（SC）超颖表面的基础上的绝缘体上硅（SOI）衬底的光学谐振调谐，并发现实现结构调谐在nm精度仅使用一个模具的NIL过程。结构调谐使我们能够获得光学谐振的微调，提供具有成本效益的，高通量的，高精度的纳米纤维。我们还表明，调谐的光学共振选择性地和显着增强荧光（FL）的染料分子在近红外范围内。发现SC超颖表面上的FL强度比基底SOI衬底上的平坦Au膜上的FL强度大450倍以上。
We show an effective procedure for lateral structure tuning in nanoimprint lithography (NIL) that has been developed as a vertical top-down method fabricating large-area nanopatterns. The procedure was applied to optical resonance tuning in stacked complementary (SC) metasurfaces based on silicon-on-insulator (SOI) substrates and was found to realize structure tuning at nm precision using only one mold in the NIL process. The structure tuning enabled us to obtain fine tuning of the optical resonances, offering cost-effective, high-throughput, and high-precision nanofabrication. We also demonstrate that the tuned optical resonances selectively and significantly enhance fluorescence (FL) of dye molecules in a near-infrared range. FL intensity on a SC metasurface was found to be more than 450-fold larger than the FL intensity on flat Au film on base SOI substrate.