Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition
Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition
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DOI：
10.1116/1.4961113
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发表时间：
2016-09-01
影响因子：
2.9
通讯作者：
Franssila, Sami
中科院分区：
文献类型：
--
作者：
Berdova, Maria;Liu, Xuwen;Franssila, Sami
研究原子层沉积HfO2薄膜的力学性能对于在微器件中实现这些薄膜具有重要意义。薄膜的力学性能随成分和结构的变化而变化，并随沉积温度和退火后的变化而变化。本文描述了生长态和退火态HfO2的弹性模量、硬度和耐磨性。在纳米压痕测量中，弹性模量和硬度随沉积温度的变化相对稳定在163 ~ 165 GPa和8.3 ~ 9.7 GPa范围内。HfO2退火后，由于薄膜结晶和致密化，硬度显著提高，达到14.4 GPa。结构变化也导致弹性模量增加，最高可达197 GPa。耐磨性不随沉积温度的变化而变化，但退火后耐磨性有所提高。(C) 2016年美国真空学会。
The investigation of mechanical properties of atomic layer deposition HfO2 films is important for implementing these layers in microdevices. The mechanical properties of films change as a function of composition and structure, which accordingly vary with deposition temperature and post-annealing. This work describes elastic modulus, hardness, and wear resistance of as-grown and annealed HfO2. From nanoindentation measurements, the elastic modulus and hardness remained relatively stable in the range of 163-165 GPa and 8.3-9.7 GPa as a function of deposition temperature. The annealing of HfO2 caused significant increase in hardness up to 14.4 GPa due to film crystallization and densification. The structural change also caused increase in the elastic modulus up to 197 GPa. Wear resistance did not change as a function of deposition temperature, but improved upon annealing. (C) 2016 American Vacuum Society.