Wideband two-port beam splitter of a binary fused-silica phase grating.

Wideband two-port beam splitter of a binary fused-silica phase grating.
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DOI:
10.1364/ao.47.004004
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发表时间:
2008-08
期刊:
影响因子:
1.9
通讯作者:
Bo Wang;Changhe Zhou;Jijun Feng;H. Ru;Jiangjun Zheng
Bo Wang;Changhe Zhou;Jijun Feng;H. Ru;Jiangjun Zheng
中科院分区:
工程技术4区
文献类型:
--
作者:
Bo Wang;Changhe Zhou;Jijun Feng;H. Ru;Jiangjun Zheng

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The usual beam splitter of multilayer-coated film with a wideband spectrum is not easy to achieve. We describe the realization of a wideband transmission two-port beam splitter based on a binary fused-silica phase grating. To achieve high efficiency and equality in the diffracted 0th and -1st orders, the grating profile parameters are optimized using rigorous coupled-wave analysis at a wavelength of 1550 nm. Holographic recording and the inductively coupled plasma dry etching technique are used to fabricate the fused-silica beam splitter grating. The measured efficiency of (45% x 2) = 90% diffracted into the both orders can be obtained with the fabricated grating under Littrow mounting. The physical mechanism of such a wideband two-port beam splitter grating can be well explained by the modal method based on two-beam interference of the modes excited by the incident wave. With the high damage threshold, low coefficient of thermal expansion, and wideband high efficiency, the presented beam splitter etched in fused silica should be a useful optical element for a variety of practical applications.