Effect of substrate temperature on magnetic properties of strontium ferrite thin films

Effect of substrate temperature on magnetic properties of strontium ferrite thin films
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衬底温度对锶铁氧体薄膜磁性能的影响

DOI:
10.1109/20.617857
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发表时间:
1997
影响因子:
2.1
通讯作者:
T. Yamazaki
T. Yamazaki
中科院分区:
工程技术4区
文献类型:
--
作者:
A. Morisako;M. Matsumoto;S. Takei;T. Yamazaki

文献摘要

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采用直流磁控溅射法制备了锶六角铁氧体薄膜,并对其晶体结构和磁性能进行了研究。发现SrM膜的晶化温度为500/s/l deg/C左右。在550/spl ° C的衬底温度(Ts)下观察到c轴的优先取向。在550/spl deg/C的Ts下制备的薄膜在垂直方向上表现出3.5kOe的最大极化率。
Strontium hexagonal ferrite (SrM) thin films were prepared by a dc magnetron sputtering system, and the crystal structure and magnetic properties were studied. It was found that crystallization temperature of SrM film was around 500/spl deg/C. Preferential orientation of c-axis was observed at the substrate temperature (Ts) of 550/spl deg/C. The films prepared at Ts of 550/spl deg/C exhibited the maximum coercivity of 3.5 kOe in the perpendicular direction.