AMPHOTERIC NATIVE DEFECTS IN SEMICONDUCTORS
AMPHOTERIC NATIVE DEFECTS IN SEMICONDUCTORS
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DOI:
10.1063/1.101174
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发表时间:
1989-05-22
影响因子:
4
通讯作者:
WALUKIEWICZ, W
中科院分区:
文献类型:
--
作者:
WALUKIEWICZ, W
We show that a new concept of amphoteric native defects with strongly Fermi level dependent defect formation energy provides the basis for a unified explanation of a large variety of phenomena in semiconductors. Formation of Schottky barriers, particle irradiation induced compensation, doping-induced superlattice intermixing, and limits of free-carrier concentration find for the first time a common simple explanation.Identification of the processes controlling the incorporation of native (or intrinsic) defects during semiconductor material preparation and/or processing is of primary importance since so many electronic and structural properties critically depend on the presence of such defects.! In this letter we present a simple and general theory which provides a unified understanding of the factors affecting the abundances and reactions of simple native defects in semiconductors. The theory is based on a recently introduced concept of amphoteric native defects. 2, 3 Within this fundamental concept a large multiplicity of apparently unrelated phenomena such as Schottky barrier formation, compensation of electrical activity in particle-irradiated semiconductors, dopinginduced superlattice intermixing, and limits of free-carrier concentration can be, for the first time, understood in terms of a single unifying theme.