Aluminum diffusion and reaction in thin films of perylene-3,4,9,10-tetracarboxylic dianhydride: Depth profiles and time-dependent diffusion coefficients
Aluminum diffusion and reaction in thin films of perylene-3,4,9,10-tetracarboxylic dianhydride: Depth profiles and time-dependent diffusion coefficients
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DOI：
10.1063/1.2763980
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发表时间：
2007-10
影响因子：
4
通讯作者：
H. Yoshida;N. Sato
中科院分区：
文献类型：
--
作者：
H. Yoshida;N. Sato
利用角分辨X射线光电子能谱（XPS）研究了真空沉积的铝金属物种（Al）在苝-3，4，9，10-四羧酸二酐（PTCDA）薄膜上的扩散和反应。假设Al的扩散由具有随时间变化的扩散系数的一维扩散方程描述，对所获得的数据进行分析。深度分布和扩散系数分别得到反应和金属铝。结果表明，在室温下，金属Al在沉积过程中迅速扩散，而在沉积后金属扩散仍以较低的速率继续。另一方面，反应的Al不会进一步扩散到PTCDA层中。
Diffusion and reaction of aluminum metal species (Al) vacuum deposited on perylene-3,4,9,10-tetracarboxylic dianhydride (PTCDA) thin films were investigated using angle resolved x-ray photoemission spectroscopy. The acquired data were analyzed assuming that the diffusion of Al is described by a one-dimensional diffusion equation with a time-dependent diffusion coefficient. Depth profiles and diffusion coefficients are obtained for reacted and metallic Al separately. The results show that the metallic Al diffuses rapidly during the deposition while the metal diffusion continues at a lower rate even after the deposition at room temperature. On the other hand, the reacted Al does not diffuse further into the PTCDA layers.