Improved analyzer multilayers for aluminium and boron detection with x-ray fluorescence.
Improved analyzer multilayers for aluminium and boron detection with x-ray fluorescence.
复制标题
改进的多层分析仪可通过 X 射线荧光检测铝和硼。
DOI：
10.1364/ao.40.002747
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发表时间：
2001
期刊：
影响因子：
1.9
通讯作者：
R. Bormann
中科院分区：
文献类型：
--
作者：
P. Ricardo;J. Wiesmann;C. Nowak;C. Michaelsen;R. Bormann
我们用波长色散X射线荧光光谱仪改进了分析器多层膜，用于检测硅片上的铝(Al)和硼(B)。对于硅片上Al的检测，我们发现WSi(2)/Si和Ta/Si多层膜提供的检测下限分别比目前使用的W/Si多层膜高42%和60%。对于硅片上B的检测，我们发现La/B(4)C多层膜比传统使用的Mo/B(4)C多层膜的检测下限提高了约28%。
We have developed improved analyzer multilayers for the detection of aluminium (Al) and boron (B) on silicon (Si) wafers with wavelength-dispersive x-ray fluorescence spectrometers. For the detection of Al on Si wafers we show that WSi(2)/Si and Ta/Si multilayers provide detection limits that are 42% and 60% better, respectively, than with currently used W/Si multilayers. For the detection of B on Si wafers we show that La/B(4)C multilayers improve the detection limit by approximately 28% compared with a conventionally used Mo/B(4)C multilayer.