Comparative study on the effect of RF and DBD plasma treatment on PTFE surface modification

Comparative study on the effect of RF and DBD plasma treatment on PTFE surface modification
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DOI:
10.1016/j.matchemphys.2004.01.026
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发表时间:
2004-06-15
影响因子:
4.6
通讯作者:
Meenan, BJ
Meenan, BJ
中科院分区:
材料科学3区
文献类型:
--
作者:
Liu, CZ;Wu, JQ;Meenan, BJ

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本文用比较的方法研究了介质阻挡放电(DBD)等离子体和射频(R-F)等离子体对聚四氟乙烯(PTFE)表面润湿性、化学成分和微观结构变化的影响。由于表面化学成分和表面微结构的变化,两种等离子体都能显著改善聚四氟乙烯的表面润湿性。高真空(HV)等离子体中的高能物种导致聚四氟乙烯表面严重腐蚀,导致聚四氟乙烯最外层的分解,导致四氟乙烯通过(CF2)(N)链断裂而析出,产生低聚链段。相比之下,DBD等离子体中很少有重物种具有足够高的能量来导致(CF2)(N)链的断裂产生低聚片段,因此腐蚀效应较小。射频等离子体处理表面的接触角随能量剂量的变化呈现出两个阶段的下降行为:首先是快速下降阶段,然后是平稳下降阶段。相比之下,DBD等离子体处理的表面有三个明显的行为阶段。在DBD等离子体处理早期(低能量剂量),接触角急剧减小,然后是一个稳定阶段,然后是一个缓慢的恢复阶段。(C)2004爱思唯尔B.V.保留所有权利。
This paper reports, in a comparative method, the effect of dielectric barrier discharge (DBD) plasma and radio frequency (R-F) plasma on the surface wettability, chemistry and microstructure changes of the surface of polytetrafluroethylene (PTFE). Both types of plasma could improve the PTFE surface wettability significantly owing to the changes in surface chemistry and surface microstructure. The high-energy species in high-vacuum (HV) plasma cause the PTFE surface severely etched and causing decomposition of outmost layer of PTFE, results in the evolution of tetrafluoroethylene via scission of the (CF2)(n) chain to yield oligomeric segments. In comparison, few heavy species in DBD plasma have high enough energy to cause the scission of the (CF2)(n) chain to yield oligomeric segments, thus less etching effect. The contact angle variation with energy dose on RF plasma-treated surface demonstrated a two-stage decrease behaviour: an initial fast decrease stage followed by a levelled-off stage. In comparison, three stages of behaviour are evident for DBD plasma-treated surface. A drastic decrease of the contact angle was recorded during early DBD plasma treatment (at low energy dose), followed by a steady stage and then a slow recovery stage. (C) 2004 Elsevier B.V. All rights reserved.