Influences of In2O3 crystal grains formed by anneal on characteristics of hexagonal InN crystalline films grown on Si(111) substrates

Influences of In2O3 crystal grains formed by anneal on characteristics of hexagonal InN crystalline films grown on Si(111) substrates
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退火形成的In2O3晶粒对Si(111)衬底上生长的六方InN晶体薄膜特性的影响

DOI:
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发表时间:
2004
期刊:
Jpn.J.Appl.Phys. 43,2A
影响因子:
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通讯作者:
Yoshiyuki Harada
Yoshiyuki Harada
中科院分区:
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文献类型:
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作者:
Tokuo Yodo;Yasunobu Kitayama;Kazunari Miyaki;Hiroaki Yona;Yoshiyuki Harada

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