Second‐ and third‐harmonic generations in ultrathin phthalocyanine films prepared by the molecular‐beam epitaxy technique
Second‐ and third‐harmonic generations in ultrathin phthalocyanine films prepared by the molecular‐beam epitaxy technique
复制标题
分子束外延技术制备超薄酞菁薄膜的二次和三次谐波产生
DOI：
10.1063/1.349769
复制
发表时间：
1991
影响因子：
3.2
通讯作者：
Y. Maruyama
中科院分区：
文献类型：
--
作者：
H. Hoshi;N. Nakamura;Y. Maruyama
利用Nd:YAG激光基光在Maker条纹几何实验中观察到氟桥接酞菁铝聚合物超薄（200‐A）薄膜中的第二和第三次谐波。采用分子束外延技术制备了两种不同取向的单晶和多晶薄膜。根据薄膜结构的对称性，讨论了观察到的二次谐波和三次谐波强度与光偏振和入射角的关系。在单晶薄膜中实现了谐波强度的增强。
Second‐ and third‐harmonic generations in ultrathin (200‐A)films of fluoro‐bridged aluminum phthalocyanine polymer have been observed in the geometry of Maker fringe experiment using Nd:YAG laser fundamental light. Two types of films, single‐crystalline and polycrystalline films, with different orientations grown by the molecular‐beam epitaxy technique have been used. Observed dependence of the generated second‐ and third‐harmonic intensities on the polarization of light and the angle of incidence is discussed based on the symmetry of the film structures. Enhancement of the harmonic intensities is realized in the single‐crystalline film.