Patterned Magnetic Permalloy and Nickel Films: Fabrication by Electron Beam and X-Ray Lithographic Techniques
Patterned Magnetic Permalloy and Nickel Films: Fabrication by Electron Beam and X-Ray Lithographic Techniques
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图案化磁性坡莫合金和镍薄膜：通过电子束和 X 射线光刻技术制造
DOI：
10.1143/jjap.41.5149
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发表时间：
2002
影响因子：
1.5
通讯作者：
G. Carlotti
中科院分区：
文献类型：
--
作者：
P. Candeloro;A. Gerardino;E. Fabrizio;S. Cabrini;G. Giannini;Luigi Mastrogiacomo;M. Ciria;R. O'handley;G. Gubbiotti;G. Carlotti
电子束（e-beam）和X射线光刻技术已用于在（1×1）mm2的面积上制造坡莫合金（Ni80Fe20）和镍矩形和三角形点和反点。点尺寸和间距范围分别为 500 nm 至 1 µm 和 250 nm 至 50 nm。通过磁光克尔效应（MOKE）磁力测量和布里渊光散射（BLS）技术研究了图案化引起的磁性能的变化。
Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1×1) mm2. Dot dimensions and spacings range from 500 nm to 1 µm and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.