Helium ion beam milling and Electron beam lithography to create sub-20nm sized domain wall magnetoresistance spin-valve
Helium ion beam milling and Electron beam lithography to create sub-20nm sized domain wall magnetoresistance spin-valve
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氦离子束铣削和电子束光刻技术创建亚 20 纳米尺寸的畴壁磁阻自旋阀
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通讯作者:
Yudong Wang (Author)
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作者:
Yudong Wang (Author)