Edge asymptotics of planar electron densities
Edge asymptotics of planar electron densities
复制标题
平面电子密度的边缘渐近
DOI：
10.1142/s0217979294000695
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发表时间：
1993
影响因子：
1.7
通讯作者：
G. Dunne
中科院分区：
文献类型：
--
作者：
G. Dunne
讨论了在较高朗道能级下有限平面电子密度边缘的N→∞极限。对于满填充，粒子数与磁通量相关，因此与边界位置相关，使得N→∞极限在边缘处比在体块处更加微妙。在第n朗道水平，密度在边缘呈现n个不同的阶跃，在圆形和矩形样本中都是如此。用渐近展开式计算了单个朗道能级和连续填充朗道能级的边界特征。
The N→∞ limit of the edges of finite planar electron densities is discussed for higher Landau levels. For full filling, the particle number is correlated with the magnetic flux, and hence with the boundary location, making the N→∞ limit more subtle at the edges than in the bulk. In the nth Landau level, the density exhibits n distinct steps at the edge, in both circular and rectangular samples. The boundary characteristics for individual Landau levels, and for successively filled Landau levels, are computed in an asymptotic expansion.