Access to Disparate Soft Matter Materials by Curing with Two Colors of Light
Access to Disparate Soft Matter Materials by Curing with Two Colors of Light
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DOI：
10.1002/adma.201807288
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发表时间：
2019-02-22
影响因子：
29.4
通讯作者：
Barner-Kowollik, Christopher
中科院分区：
文献类型：
--
作者：
Bialas, Sabrina;Michalek, Lukas;Barner-Kowollik, Christopher
介绍了一种多材料光致抗蚀剂的平台技术，该技术可以被不同颜色的光正交固化。抗蚀剂的光化学被设计成使得一个波长选择性地激活一组大分子的交联，而不同的波长引发不同组链的网络形成。因此，每个波长对于抗蚀剂内的特定光致电离反应是高度选择性的。重要的是，较短的波长不会引起相同抗蚀剂混合物内较长波长选择性物质的连接，定义为"波长正交性"。独特的是，这种双色可寻址抗蚀剂系统允许通过简单地选择固化波长来生成空间分辨的软物质材料，从而构成波长正交的多材料抗蚀剂，其应用范围从涂层到多材料架构的3D增材制造。
A platform technology for multimaterial photoresists that can be orthogonally cured by disparate colors of light is introduced. The resist's photochemistry is designed such that one wavelength selectively activates the crosslinking of one set of macromolecules, while a different wavelength initiates network formation of a different set of chains. Each wavelength is thus highly selective towards a specific photoligation reaction within the resist. Critically, the shorter wavelength does not induce ligation of the longer wavelength selective species within the same resist mixture, defined as "wavelength orthogonality." Uniquely, this dual-color addressable resist system allows generating spatially resolved soft matter materials by simply selecting the curing wavelength, thus constituting a wavelength-orthogonal multimaterial resist with applications ranging from coatings to 3D additive manufacturing of multimaterial architectures.