Plasma potentials and performance of the advanced electron cyclotron resonance ion source
Plasma potentials and performance of the advanced electron cyclotron resonance ion source
复制标题
先进电子回旋共振离子源的等离子体势和性能
DOI：
10.1063/1.1144583
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发表时间：
1994
期刊：
影响因子：
--
通讯作者：
C. Lyneis
中科院分区：
文献类型：
--
作者：
Z. Xie;C. Lyneis
在LBL型先进电子回旋共振(AECR)离子源上测量了不同条件下的平均等离子体电势。测定了AECR中氧、Ar和Ar与氧混合的等离子体的平均电势。这些等离子体电势相对于等离子体腔壁是正的，并且在几十伏的数量级上。通过电子枪或从二次电子发射非常高的氧化铝墙面涂层注入等离子体的电子会降低等离子体的电势，气体混合也是如此。AECR源中较低的等离子体势与高电荷态离子的产生增加相一致，这表明离子限制时间更长。来自外部注入或壁面涂层的额外电子的作用是降低平均等离子体电势，增加ECR等离子体的Neτi。有了足够的额外电子，气体混合的需要可以被消除或减少到较低的水平，因此源可以在较低的中性压力下运行。减价。
The mean plasma potential was measured on the LBL advanced electron cyclotron resonance (AECR) ion source for a variety of conditions. The mean potentials for plasmas of oxygen, argon, and argon mixed with oxygen in the AECR were determined. These plasma potentials are positive with respect to the plasma chamber wall and are on the order of tens of volts. Electrons injected into the plasma by an electron gun or from an aluminum oxide wall coating with a very high secondary electron emission reduce the plasma potential as does gas mixing. A lower plasma potential in the AECR source coincides with enhanced production of high charged state ions indicating longer ion confinement times. The effect of the extra electrons from external injection or wall coatings is to lower the average plasma potential and to increase the neτi of the ECR plasma. With sufficient extra electrons, the need for gas mixing can be eliminated or reduced to a lower level, so the source can operate at lower neutral pressures. A reduction...