TUNGSTEN NITRIDE THIN-FILMS PREPARED BY MOCVD

TUNGSTEN NITRIDE THIN-FILMS PREPARED BY MOCVD
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DOI:
10.1557/jmr.1993.1353
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发表时间:
1993-06-01
影响因子:
2.7
通讯作者:
CHUANG, SH
CHUANG, SH
中科院分区:
材料科学4区
文献类型:
--
作者:
CHIU, HT;CHUANG, SH

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以(tBuN)2W(NHtBu)2为单源前驱体,采用低压金属有机化学气相沉积(MOCVD)法制备了多晶氮化钨薄膜。在冷壁反应器中,在723 ~ 923 K的温度下,在玻璃和硅衬底上沉积均匀薄膜,而前驱体在333 ~ 363 K的温度下蒸发。根据生长条件的不同,生长速度为2-10 nm/min。通过波长色散光谱(WDS)研究,薄膜的体元素组成最好描述为WN(x) (x = 0.7-1.8)。N/W比随沉积温度的升高而降低。x射线衍射(XRD)研究表明,薄膜具有立方结构,晶格参数a = 0.414 ~ 0.418 nm。晶格参数随N/W比的减小而减小。化学计量WN薄膜的平均晶格参数a为0.4154 nm。x射线光电子能谱(XPS)显示,W4f7/2、W4f5/2和N1s电子的结合能分别为33.0、35.0和397.3 eV。通过二次离子质谱(SIMS)和俄歇谱深度谱分析,发现膜内元素分布均匀。SIMS深度剖面也表明膜中C和0浓度较低。采用气相色谱-质谱(GC-MS)和核磁共振(NMR)对77 K下的挥发性产物进行分析。在可冷凝混合物中检测到异丁烯、乙腈、氰化氢和氨。提出了可能的反应途径来推测这些分子的起源。
Polycrystalline tungsten nitride thin films were grown by low pressure metallo-organic chemical vapor deposition (MOCVD) using (tBuN)2W(NHtBu)2 as the single-source precursor. Deposition of uniform thin films on glass and silicon substrates was carried out at temperatures 723-923 K in a cold-wall reactor, while the precursor was vaporized at 333-363 K. The growth rates were 2-10 nm/min depending on the condition employed. Bulk elemental composition of the thin films, studied by wavelength dispersive spectroscopy (WDS), is best described as WN(x) (x = 0.7-1.8). The N/W ratio decreased with increasing temperature of deposition. X-ray diffraction (XRD) studies showed that the films have cubic structures with the lattice parameter a = 0.414-0.418 nm. The lattice parameter decreased with decreasing N/W ratio. Stoichiometric WN thin films showed an average lattice parameter a of 0.4154 nm. X-ray photoelectron spectroscopy (XPS) showed that binding energies of the W4f7/2, W4f5/2, and N1s electrons were 33.0, 35.0, and 397.3 eV, respectively. Elemental distribution within the films, studied by secondary ion mass spectroscopy (SIMS) and Auger spectroscopy depth profilings, was uniform. The SIMS depth profiling also indicated that C and 0 concentrations were low in the film. Volatile products trapped at 77 K were analyzed by gas chromatography-mass spectroscopy (GC-MS) and nuclear magnetic resonance (NMR). Isobutylene, acetonitrile, hydrogen cyanide, and ammonia were detected in the condensable mixtures. Possible reaction pathways were proposed to speculate the origin of these molecules.