In situ surface x-ray diffraction studies of homoepitaxial electrochemical growth on Au(100).
In situ surface x-ray diffraction studies of homoepitaxial electrochemical growth on Au(100).
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Au(100) 上同质外延电化学生长的原位表面 X 射线衍射研究。
DOI：
10.1103/physrevlett.96.246101
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发表时间：
2006
影响因子：
8.6
通讯作者：
Olaf M. Magnussen
中科院分区：
文献类型：
--
作者：
K. Krug;J. Stettner;Olaf M. Magnussen
以Au(100)上的同质外延电沉积为例，进行了固-液界面生长的直接原位x射线表面散射研究。随着势能的降低，从阶跃流动到逐层生长，表现为X射线强度的分层振荡，然后是多层生长，最后又回到了逐层生长。这种复杂的生长行为可以用阴离子共吸附作用和与电位相关的金表面重构对金表面迁移率的影响来解释。
Direct in situ x-ray surface scattering studies of growth at a solid-liquid interface are demonstrated using the homoepitaxial electrodeposition on Au(100) as an example. With decreasing potential transitions from step-flow to layer-by-layer growth, manifested by layering oscillations in the x-ray intensity, then to multilayer growth, and finally back to layer-by-layer growth were observed. This complex growth behavior can be explained by the effect of anion coadsorbates and the potential-dependent Au surface reconstruction on the Au surface mobility.