Magneto-optic Kerr ellipticity of epitaxial Co/Cu overlayers and superlattices.
Magneto-optic Kerr ellipticity of epitaxial Co/Cu overlayers and superlattices.
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DOI：
10.1103/physrevb.46.8195
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发表时间：
1992-10
期刊：
影响因子：
--
通讯作者：
Qiu;Pearson;Báder
中科院分区：
文献类型：
--
作者：
Qiu;Pearson;Báder
采用分子束外延技术在Cu（100）和Cu（111）单晶上生长了Co/Cu覆盖层和超晶格。电子衍射和俄歇能谱被用来表征薄膜的生长，并确认外延。还针对10- 500埃厚的Co覆盖层和各种超晶格测量了633 nm处的克尔椭圆率，作为薄膜中双层数量的函数。的椭圆率数据最初线性增加的总Co厚度的函数，在符合雅阁法预期的磁光信号在磁光极限。然而，为了模拟所观察到的厚度趋势，有必要为复杂的磁光耦合常数分配一个不同于先前报道的值。
Co/Cu overlayers and superlattices were grown by molecular-beam epitaxy onto Cu(100) and Cu(111) single crystals. Electron diffraction and Auger spectroscopy were used to characterize the film growth and to confirm the epitaxy. Kerr ellipticities at 633 nm also were measured {ital in} {ital situ} both for Co overlayers that were 10--500 A thick, and for various superlattices as a function of the number of bilayers in the film. The ellipticity data initially increase linearly as a function of total Co thickness, in accord with the additivity law expected for magneto-optic signals in the ultrathin limit. In order to simulate the observed thickness trends, however, it was necessary to assign a value to the complex magneto-optic coupling constant that differs from those reported previously.