Arrays of nano-dots for cellular engineering
Arrays of nano-dots for cellular engineering
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DOI：
10.1016/s0167-9317(03)00067-4
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发表时间：
2003-06-01
影响因子：
2.3
通讯作者：
Wilkinson, CDW
中科院分区：
文献类型：
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作者：
Gadegaard, N;Thoms, S;Wilkinson, CDW
对于细胞工程应用，需要对具有纳米特征的大面积进行高效的图案化。最终产品必须以经济成本制造。直径为100 nm、节距为300 nm的凹坑对一系列不同的哺乳动物细胞具有非粘附性。描述了一种利用聚焦高斯光束的电子束光刻工具直接定义形状的策略。特征小至20纳米。在100 nm节距上制备了直径为100 nm的薄膜。研究发现，20 nm光斑大小的聚焦是关键。研究了偏转像差对写入场的影响。已经检查了各种阻力。在聚己内酯中成功地压花了图案。在机器时间方面，模具的总体成本已显著降低。(C)2003 Elsevier Science B.V.保留所有权利。
Efficient patterning of large areas with nanometre features is required for cellular engineering applications. The final product must be made at an economic cost. 100 nm diameter pits on a 300 nm pitch have shown to be non-adhesive to a range of different mammalian cells. A strategy is described which uses an electron beam lithographic tool with focussed Gaussian beam to define shapes directly. Features as small as 20 nm. in diameter on 100 nm pitch were fabricated. It was found that focus of 20 nm spot size is critical. The effect of deflection aberrations across the writing field was investigated. Various resists have been examined. Patterns were successfully embossed in poly(caprolactone). The overall cost of a die in terms of machine time has been significantly reduced. (C) 2003 Elsevier Science B.V. All rights reserved.