Picosecond laser patterning of NiCr thin film strain gages
Picosecond laser patterning of NiCr thin film strain gages
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NiCr 薄膜应变计的皮秒激光图案化
DOI：
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发表时间：
2010
期刊：
影响因子：
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通讯作者：
R. Kling
中科院分区：
文献类型：
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作者：
O. Suttmann;Michael Gosselin;U. Klug;R. Kling
本文介绍了Al_2O_3基片上厚度为23 ~ 246 nm的NiCr层的烧蚀实验结果。研究的参数是注量，脉冲数，膜厚和基板粗糙度。为了确定稳定的工艺参数，对去除阈值的参数的影响进行了分析。作为测量机械应力的基本部件，图案化NiCr薄膜是溅射薄膜应变计发展所必需的。与传统的应变计不同，这种新方法的应变传感器将能够抵抗环境条件变化时的蠕变或膨胀。
This paper presents results of ablation experiments of NiCr layers with thicknesses ranging from 23nm to 246nm on Al2O3 substrates. Investigated parameters are fluence, number of pulses, film thickness and substrate roughness. The influence of the parameters on the removal threshold is analyzed in order to identify stable processing parameters. Patterned NiCr thin films as an essential component for the measurement of mechanical stress are required for the development of sputtered thin film strain gages. With this new approach strain sensors will be resistant against creeping or swelling through changing ambient conditions unlike conventional strain gages.