The Effect of the Redox Potential on the Leaching of Chalcopyrite in Chloride Media

The Effect of the Redox Potential on the Leaching of Chalcopyrite in Chloride Media
复制标题

氯化物介质中氧化还原电位对黄铜矿浸出的影响

DOI:
--
复制
发表时间:
2007
期刊:
Proceedings of the 6th International Copper-Cobre Conference 4
影响因子:
--
通讯作者:
R. Diaz Alorro and M. Tsunekawa
R. Diaz Alorro and M. Tsunekawa
中科院分区:
--
文献类型:
--
作者:
K. Yoo;J-C;Lee;N. Hiroyoshi;R. Diaz Alorro and M. Tsunekawa

文献摘要

被引文献

相似文献