The Effect of the Redox Potential on the Leaching of Chalcopyrite in Chloride Media
The Effect of the Redox Potential on the Leaching of Chalcopyrite in Chloride Media
复制标题
氯化物介质中氧化还原电位对黄铜矿浸出的影响
DOI:
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发表时间:
2007
期刊:
影响因子:
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通讯作者:
R. Diaz Alorro and M. Tsunekawa
中科院分区:
文献类型:
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作者:
K. Yoo;J-C;Lee;N. Hiroyoshi;R. Diaz Alorro and M. Tsunekawa