Influence of Silicon Substrate Surface Finish on the Screen‐Printed Silver Metallization of Polysilicon‐Based Passivating Contacts
Influence of Silicon Substrate Surface Finish on the Screen‐Printed Silver Metallization of Polysilicon‐Based Passivating Contacts
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硅基板表面光洁度对多晶硅钝化触点丝网印刷银金属化的影响
DOI：
10.1002/pssa.202100869
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发表时间：
2022
期刊：
影响因子：
--
通讯作者：
M. Zeman
中科院分区：
文献类型：
--
作者：
Aditya Chaudhary;Jan Hoß;J. Lossen;F. Huster;R. Kopecek;R. van Swaaij;M. Zeman
基于薄界面氧化物和高掺杂多晶硅层的钝化接触已经成为提高工业硅太阳能电池效率的下一个进化步骤。为了最大限度地利用这一层堆栈，限制金属多晶硅界面的损耗是至关重要的，它可以用金属多晶硅复合电流密度(J0met)和接触电阻率来量化。在可获得多种硅衬底表面光洁度的电池概念中，了解表面光洁度如何影响J0met和接触电阻率是至关重要的。本文采用市售的烧成银浆料和金属-多晶硅复合电流密度和接触电阻率，对三种不同的硅衬底表面光洁度，即：平面或锯齿损伤刻蚀(SDE)、酸性溶液化学抛光和碱性金字塔织构进行了研究。对于平面样品，对于15 0和2 0 0 nm n+多晶硅层厚度，得到的接触电阻率值均小于3Ω m cm 2，其中J0 Met按掺杂区复合电流密度(J0pass)的顺序排列.研究结果表明，具有平坦衬底形貌的样品比具有纹理表面的样品性能更好。
Passivated contact based on a thin interfacial oxide and a highly doped polysilicon layer has emerged as the next evolutionary step to increase the efficiencies of industrial silicon solar cells. To take maximum advantage from this layer stack, it is vital to limit the losses at the metal polysilicon interface, which can be quantified as metal polysilicon recombination current density (J 0met) and contact resistivity. In cell concepts, wherein a large variety of silicon substrate surface finish can be obtained, it is essential to know how the surface finish affects the J 0met and contact resistivity. Herein, commercially available fire through silver paste and the metal‐polysilicon recombination current densities and contact resistivity are used for three different silicon substrate surface finishes, namely: planar or saw damage etched (SDE), chemically polished in acidic solution and alkaline pyramidal textured. Contact resistivity values below 3 mΩ cm2 with J 0met in order of the recombination current density of the doped region (J 0pass) are obtained for samples with planar surface for both 150 and 200 nm n+ polysilicon layer thicknesses. The results presented in this work show that the samples with flat substrate morphology outperform the samples with textured surfaces.