Reflectance confocal microscopy of optical phantoms.
Reflectance confocal microscopy of optical phantoms.
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DOI：
10.1364/boe.3.001162
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发表时间：
2012-06-01
影响因子：
3.4
通讯作者：
Samatham R
中科院分区：
文献类型：
--
作者：
Jacques SL;Wang B;Samatham R
用反射式共焦扫描激光显微镜（rCSLM）在488 nm波长下对三种光学模型进行了成像：（1）100 nm直径的光学模型;体积分数为2%的凝胶中的聚苯乙烯微球，（2）固体聚氨酯模型（INO BiomimicTM），和（3）普通反射标准（SpectralonTM）。非侵入性方法测量了反射信号的指数衰减，因为焦点（zf）移动到更深的材料。将衰减系数μ和指前因子ρ这两个实验值映射为材料的光学散射特性，即散射系数μs和散射各向异性g。结果表明，体模类型（1）、（2）和（3）的μs分别为58、8-24和130-200 cm-1。g分别在0.112、0.53-0.67和0.003-0.26之间变化。
A reflectance confocal scanning laser microscope (rCSLM) operating at 488-nm wavelength imaged three types of optical phantoms: (1) 100-nm-dia. polystyrene microspheres in gel at 2% volume fraction, (2) solid polyurethane phantoms (INO BiomimicTM), and (3) common reflectance standards (SpectralonTM). The noninvasive method measured the exponential decay of reflected signal as the focus (zf) moved deeper into the material. The two experimental values, the attenuation coefficient μ and the pre-exponential factor ρ, were mapped into the material optical scattering properties, the scattering coefficient μs and the anisotropy of scattering g. Results show that μs varies as 58, 8–24, and 130–200 cm-1 for phantom types (1), (2) and (3), respectively. The g varies as 0.112, 0.53–0.67, and 0.003–0.26, respectively.