Characterization of permalloy thin films electrodeposited on Si(111) surfaces
Characterization of permalloy thin films electrodeposited on Si(111) surfaces
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DOI：
10.1063/1.365305
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发表时间：
1997-06-01
影响因子：
3.2
通讯作者：
Norton, PR
中科院分区：
文献类型：
--
作者：
Gao, LJ;Ma, P;Norton, PR
确定了在 Si(111) 表面上直接电镀 Ni-Fe 坡莫合金（19% Fe，81% Ni）薄膜的电化学条件。通过俄歇电子能谱深度剖面分析、扫描电子显微镜、透射电子显微镜、原子力显微镜和磁光克尔效应测量等各种技术来检查薄膜的成分、结构和磁性。坡莫合金薄膜由直径 10-50 nm 的 Ni/Fe 纳米微晶组成。结果发现，矫顽力随着膜厚度的增加而降低。对薄膜进行低于 200 摄氏度的适度退火可以释放薄膜中的应力并导致矫顽力下降。薄膜在300℃以上退火后发生界面扩散。Ni-Fe薄膜在完成厚度>20 nm的缓冲层电沉积后表现出体特性；低于这个厚度，薄膜是不连续的，由硅表面上分离的簇或岛组成。 (C) 1997 年美国物理研究所。
The electrochemical conditions for the direct electroplating of Ni-Fe Permalloy (19% Fe, 81% Ni) thin films onto Si(111) surfaces were determined. The film composition, structure, and magnetic properties were examined by various techniques involving Auger electron spectroscopy depth profiles analysis, scanning electron microscopy, transmission electron microscopy, atomic force microscopy, and magneto-optic Kerr effect measurements. The Permalloy films consisted of 10-50-nm-diam Ni/Fe nanocrystallites. It was found;hat the coercivity decreased with increased film thickness. Moderate annealing of the films below 200 degrees C released stress in the films and led to a decrease in coercivity. Interfacial diffusion occurred after the annealing of films above 300 degrees C. The Ni-Fe films exhibited bulk properties after the completion of electrodeposition of a buffer layer of thickness >20 nm; below this thickness, the films were discontinuous and consisted of separated clusters or islands on the Si surface. (C) 1997 American Institute of Physics.