Efficient photocatalytic degradation of phenol over Co3O4/BiVO4 composite under visible light irradiation
Efficient photocatalytic degradation of phenol over Co3O4/BiVO4 composite under visible light irradiation
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DOI：
10.1021/jp063441z
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发表时间：
2006-10-19
影响因子：
3.3
通讯作者：
Wu, Yahui
中科院分区：
文献类型：
--
作者：
Long, Mingce;Cai, Weimin;Wu, Yahui
采用浸渍法制备了具有p-n异质结半导体结构的Co 3 O 4/BiVO 4复合光催化剂。采用X射线衍射（XRD）、X射线光电子能谱（XPS）、透射电子显微镜（TEM）、BET比表面积、紫外-可见漫反射光谱等测试手段对复合光催化剂的物理和物化性能进行了表征。Co以p型Co 3 O 4形式存在，分散在n型BiVO 4表面构成异质结复合材料。该光催化剂在可见光照射下对苯酚的光催化降解表现出较强的活性。当在300 ℃下煅烧时，观察到最高的效率，钴含量为0.8wt%。根据计算的能带位置和光致发光谱，讨论了光催化活性增强的机理。
Co3O4/BiVO4 composite photocatalyst with a p-n heterojunction semiconductor structure has been synthesized by the impregnation method. The physical and photophysical properties of the composite photocatalyst have been characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), transimission electron microscopy (TEM), BET surface area, and UV-visible diffuse reflectance spectra. Co is present as p-type Co3O4 and disperses on the surface of n-type BiVO4 to constitute a heterojunction composite. The photocatalyst exhibits enhanced photocatalytic activity for phenol degradation under visible light irradiation. The highest efficiency is observed when calcined at 300 degrees C with 0.8 wt % cobalt content. On the basis of the calculated energy band positions and PL spectra, the mechanism of enhanced photocatalytic activity has been discussed.