Low temperature deposition of α-Al2O3 thin films by sputtering using a Cr2O3 template

Low temperature deposition of α-Al2O3 thin films by sputtering using a Cr2O3 template
复制标题

DOI：
10.1116/1.1513641
复制
发表时间：
2002-11
期刊：
Journal of Vacuum Science and Technology
影响因子：
--
通讯作者：
P. Jin;Guizhou Xu;M. Tazawa;K. Yoshimura;D. Music;J. Alami;U. Helmersson
P. Jin;Guizhou Xu;M. Tazawa;K. Yoshimura;D. Music;J. Alami;U. Helmersson
中科院分区：
其他
文献类型：
--
作者：
P. Jin;Guizhou Xu;M. Tazawa;K. Yoshimura;D. Music;J. Alami;U. Helmersson

文献摘要

被引文献

相似文献

本文叙述了用溅射法低温沉积α-Al_2 O_3薄膜。Cr2 O3薄层作为模板。采用纳米压痕法研究了复合材料的力学性能。
A description about low temperature deposition of a-Al2O3 thin films by sputtering was presented. Cr2O3 thin layer was used as a template. Nanoindentation was used to study the mechanical propertie ...