A well-structured metastable ceria surface
A well-structured metastable ceria surface
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DOI：
10.1063/1.4866667
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发表时间：
2014-02
影响因子：
4
通讯作者：
R. Olbrich;H. H. Pieper-H.;R. Oelke;H. Wilkens;J. Wollschläger;M. Zoellner;T. Schroeder;M. Reichling
中科院分区：
文献类型：
--
作者：
R. Olbrich;H. H. Pieper-H.;R. Oelke;H. Wilkens;J. Wollschläger;M. Zoellner;T. Schroeder;M. Reichling
通过在Si（111）上生长180 nm厚的膜，我们产生了亚稳的氧化铈表面，其形貌由具有定向三角形基底的阶梯金字塔主导。用非接触原子力显微镜和Kelvin探针力显微镜研究了超高真空中300 ~ 1150 K温度范围内退火引起的纳米尺度表面形貌和局部表面势的变化。由于表面在300 K至850 K的温度范围内是稳定的，因此对于需要具有一个O-Ce-O三层高度的规则台阶的应用是最有趣的。
By the growth of a 180 nm thick film on Si(111), we produce a metastable ceria surface with a morphology dominated by terraced pyramids with an oriented triangular base. Changes in the nanoscale surface morphology and local surface potential due to annealing at temperatures ranging from 300 K to 1150 K in the ultra-high vacuum are studied with non-contact atomic force microscopy and Kelvin probe force microscopy. As the surface is stable in the temperature range of 300 K to 850 K, it is most interesting for applications requiring regular steps with a height of one O-Ce-O triple layer.