Hydrogen‐free amorphous carbon films approaching diamond prepared by magnetron sputtering
Hydrogen‐free amorphous carbon films approaching diamond prepared by magnetron sputtering
复制标题
磁控溅射制备接近金刚石的无氢非晶碳薄膜
DOI：
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发表时间：
1996
期刊：
影响因子：
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通讯作者：
S. Logothetidis
中科院分区：
文献类型：
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作者：
S. Logothetidis
在室温下通过射频磁控溅射沉积未氢化的无定形碳膜。原位光谱椭圆光度术和实时椭圆光度术用于监测和表征沉积过程中的薄膜，并确定沉积富含 sp3 C-C 键的碳薄膜的制备条件区域。拉曼光谱和其他技术还提供并讨论了非晶薄膜表现出金刚石特性及其亚稳定性的证据。
Unhydrogenated amorphous carbon films were deposited by rf magnetron sputtering at room temperature. In situ spectroscopic ellipsometry and real time ellipsometry were used to monitor and characterize the films during deposition as well as to define the region of the preparation conditions where carbon films rich in sp3 C–C bonds are deposited. Evidence that the amorphous films exhibit the diamond character as well as their metastability were also provided and discussed by Raman spectroscopy and other techniques.