Biomimetic approaches for fabricating high-density nanopatterned arrays
Biomimetic approaches for fabricating high-density nanopatterned arrays
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DOI：
10.1021/cm062495i
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发表时间：
2007-02-20
影响因子：
8.6
通讯作者：
Deline, Vaughn
中科院分区：
文献类型：
--
作者：
Cha, Jennifer N.;Zhang, Yuan;Deline, Vaughn
为了解决当前与特征尺寸缩放相关的许多挑战，已经研究了各种光刻的替代方法。利用AB二嵌段共聚物固有的自组装特性来制作聚合物薄膜作为纳米蚀刻掩膜是一种更经济有效的技术。通过用金属如硅富集嵌段共聚物薄膜内的畴，可以制备更耐腐蚀的薄膜。与之前矿化聚合物薄膜的方法不同，我们在这里展示了一种在中性pH和温和温度下在聚苯乙烯-b-聚-4-乙烯吡啶薄膜中合成二维二氧化硅纳米图案的仿生方法。我们进一步表明，可以利用这些良性的合成条件来制造亚20nm特征的相变材料（PCM），同时保持PCM薄膜的非晶态，以便研究缩放这些材料对其结晶温度的影响。
A variety of alternative approaches to lithography have been investigated to address the many challenges currently associated with scaling of feature sizes. One of the more cost-effective techniques has been to use the intrinsic self-assemblying properties of AB diblock copolymers to make polymer thin films as nanometer etch masks. A more etch-resistant film can be fabricated through enrichment of domains within the block copolymer thin films with metals such as silicon. In contrast to previous methods for mineralizing polymer thin films, we demonstrate here a biomimetic approach for synthesizing two-dimensional silica nanopatterns at neutral pH and mild temperatures within polystyrene-b-poly-4-vinylpyridine thin films. We further show that one can employ these benign synthetic conditions to fabricate sub-20 nm features of phase change materials (PCM) while keeping the PCM film in its amorphous state in order to study the effect that scaling these materials has on their crystallization temperatures.