Direct fabrication of two-dimensional titania arrays using interference photolithography
Direct fabrication of two-dimensional titania arrays using interference photolithography
复制标题
使用干涉光刻技术直接制造二维二氧化钛阵列
DOI：
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发表时间：
2001
期刊：
影响因子：
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通讯作者：
T. Mallouk
中科院分区：
文献类型：
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作者：
A. Shishido;Ivan B. Diviliansky;I. Khoo;T. Mayer;S. Nishimura;G. L. Egan;T. Mallouk
采用干涉光刻技术，将光敏含钛单体薄膜聚合，制备了周期为0.8~2.0μm的二维二氧化钛阵列。用掺有光引发剂的甲基丙烯酸、乙二醇二甲基丙烯酸酯和乙二醇钛的混合物在355 nm，15 ns的脉冲下照射，然后用甲醇清洗，制备了2D前驱体阵列。前驱体阵列经575 °C焙烧后得到纯净的二氧化钛阵列，用光学显微镜和扫描电子显微镜对其结构进行了表征。
Two-dimensional (2D) titania arrays with periods of 0.8–2.0 μm were fabricated by polymerization of a photosensitive titanium-containing monomer film using interference photolithography. The 2D precursor arrays were prepared by exposing a mixture of methacrylic acid, ethyleneglycol dimethacrylate, and titanium ethoxide doped with photoinitiator to 355 nm, 15 ns pulses from a Nd-Yttrium–aluminum–garnet laser and then rinsing with methanol. Pure titania arrays were obtained from the precursor arrays by subsequent calcination at 575 °C. The structure of the arrays fabricated by this method was confirmed with optical microscopy and scanning electron microscopy.
影响因子：
56.9
作者：
Johnson, SA;Ollivier, PJ;Mallouk, TE
通讯作者：
Mallouk, TE