Diffusion and structural relaxation in compositionally modulated amorphous metal films
Diffusion and structural relaxation in compositionally modulated amorphous metal films
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DOI：
10.1063/1.91818
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发表时间：
1980-07
影响因子：
4
通讯作者：
M. Rosenblum;F. Spaepen;D. Turnbull
中科院分区：
文献类型：
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作者：
M. Rosenblum;F. Spaepen;D. Turnbull
通过监测 210-250 °C 等温退火过程中 (000) X 射线散射峰的卫星，测量了成分调制 (λ≈25 A) 非晶 (Pd85Si15)61/(Fe85B15)89 和 (Pd80Au7Si13)70/Fe30 薄膜的互扩散率。测量到的扩散系数低至 10−22 cm2 s−1。据观察，由于结构松弛，扩散率在退火过程中持续下降，并且仅在退火多个小时后才稳定至恒定值。 Pd-Au-Si/Fe 薄膜中同构扩散系数的活化能为 167 kJ mol−1。该值和松弛的时间尺度与早期粘度测量中观察到的相似，表明控制两个传输过程的结构缺陷之间的相似性。
The interdiffusivity in compositionally modulated (λ≈25 A) amorphous (Pd85Si15)61/(Fe85B15)89 and (Pd80Au7Si13)70/Fe30 films has been measured by monitoring the satellite of the (000) x‐ray scattering peak during isothermal anneals in the range 210–250 °C. Diffusivities as low as 10−22 cm2 s−1 have been measured. It was observed that the diffusivity decreased continuously during the annealing as a result of structural relaxation and settled down to a constant value only after many hours of annealing. The activation energy of the isoconfigurational diffusivity in the Pd‐Au‐Si/Fe films is 167 kJ mol−1. This value and the time scale of the relaxation are similar to those observed in earlier viscosity measurements, indicating a similarity between the structural defects controlling both transport processes.