Simulation calculations of mutual contamination between tungsten and carbon and its impact on plasma surface interactions
Simulation calculations of mutual contamination between tungsten and carbon and its impact on plasma surface interactions
复制标题
钨与碳相互污染及其对等离子体表面相互作用影响的模拟计算
DOI：
10.1016/s0022-3115(00)00632-2
复制
发表时间：
2001
期刊：
影响因子：
--
通讯作者：
N. Noda
中科院分区：
文献类型：
--
作者：
K. Ohya;Retsuo Kawakami;T. Tanabe;M. Wada;T. Ohgo;V. Philipps;A. Pospieszczyk;A. Huber;M. Rubel;G. Sergienko;N. Noda
利用基于动态模型的侵蚀与沉积（EDDY）计算机模拟程序，模拟了C和W同时作为等离子体表面组分而产生的相互污染。W在C上的沉积迅速增加了对D和C杂质的反射系数。将计算结果与TEXTOR-94中的C - W双测试限制器实验进行对比，发现限制器C侧的C释放主要受W沉积物中C杂质的反射，以及C的物理溅射影响；化学侵蚀受到强烈抑制。由于形成C - W混合层的动态效应，C沉积在W上逐渐改变了反射系数和溅射率。通过模拟可以很好地再现限制器W侧侵蚀带和C沉积带之间形成的尖锐边界。计算了C和W在限制表面的局部再沉积模式。
Mutual contamination between C and W, resulting from the simultaneous use of these materials as plasma facing components, is simulated by means of a computer simulation code, Erosion and Deposition based on Dynamic model (EDDY). W deposition on C rapidly increases the reflection coefficient for D and C impurity. In comparison between the calculation and a C–W twin test limiter experiment in TEXTOR-94, C release from the C side of the limiter is dominated by reflection of C impurity from the W deposits, in addition to physical sputtering of C; chemical erosion is strongly suppressed. Due to the dynamic effect which makes C–W mixed layer, C deposition on W gradually changes the reflection coefficient and sputter yields. Formation of a sharp boundary between erosion and C deposition zones on the W side of the limiter is well reproduced by simulation. Local redeposition patterns of C and W on the limiter surface are also calculated.