Extended kinematic approach to the simulation of high-resolution X-ray diffraction spectra. Application to structures with buried amorphous layers
Extended kinematic approach to the simulation of high-resolution X-ray diffraction spectra. Application to structures with buried amorphous layers
复制标题
用于模拟高分辨率 X 射线衍射光谱的扩展运动学方法。
DOI：
10.1107/s0021889897009096
复制
发表时间：
1998
影响因子：
6.1
通讯作者：
E. Zolotoyabko
中科院分区：
文献类型：
--
作者：
E. Zolotoyabko
本文提出了一种利用原子平面散射波直接求和来模拟高分辨X射线衍射谱的新方法。计算程序，在一般情况下，是服从的结构和几何参数的局部变化的介绍。对于这里考虑的重要结构，即三层结构与非晶层“夹”在两个结晶层之间具有密切匹配的晶格参数，考虑到局部波动的界面厚度和缺陷引起的波动的面间距。衍射光谱的解析表达式推导出允许的表征问题的详细分析。结果首次发现晶格无序度对强度条纹的角周期性有很大的影响。应用这种方法的研究与埋层非晶硅晶体进行了讨论。
A new approach to the simulation of high-resolution X-ray diffraction spectra utilizing direct summation of waves scattered by atomic planes has been developed. The calculation procedure, in general, is amenable to the introduction of local variations of structural and geometric parameters. For the important structure under consideration here, viz the triple-layered structure with an amorphous layer `sandwiched' between two crystalline layers having closely matched lattice parameters, account was taken of local fluctuations of the interface thickness and of defect-induced fluctuations of the interplanar spacing. An analytical expression for the diffraction spectrum was derived which allowed a detailed analysis of the characterization problem. As a result, a strong influence of the lattice disorder on the angular periodicity of intensity fringes was found for the first time. Application of this approach to the study of silicon crystals with buried amorphous layers is discussed.