Observation of magnetization reversal of thin-film permalloy nanostructures using ballistic electron magnetic microscopy
Observation of magnetization reversal of thin-film permalloy nanostructures using ballistic electron magnetic microscopy
复制标题
使用弹道电子磁显微镜观察薄膜坡莫合金纳米结构的磁化反转
DOI：
10.1063/1.1290150
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发表时间：
2000
期刊：
影响因子：
--
通讯作者：
R. Buhrman
中科院分区：
文献类型：
--
作者：
W. Rippard;A. Perrella;P. Chalsani;F. Albert;J. Katine;R. Buhrman
我们已经成像的薄膜坡莫合金（Ni80Fe20）纳米结构的磁化反转过程中，使用弹道电子磁显微镜。它们的开关行为通常受到端部畴的形成和随后的畴壁在磁场作用下的传播的影响。偶尔，这个过程会导致形成360°畴壁，该畴壁在否则会切换结构的场中是稳定的。在零施加场的纳米结构的结果状态是非常不同的典型观察到的近单畴状态。结构的磁化强度可以在固定磁场中显示突变。
We have imaged the magnetization reversal process of thin-film permalloy (Ni80Fe20) nanostructures using ballistic electron magnetic microscopy. Their switching behavior is often influenced by the formation of end domains and the subsequent domain-wall propagation under application of a magnetic field. Occasionally, this process leads to the formation of a 360° domain wall that is stable in fields which would otherwise switch the structure. The resulting state of the nanostructure in zero-applied field is very different from the near-single-domain state typically observed. The magnetization of the structure can show abrupt changes in a fixed magnetic field.