Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet
Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet
复制标题
极紫外Si/Mo多层反射镜的结构与性能
DOI：
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发表时间：
1994
期刊：
影响因子：
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通讯作者：
C. Falco
中科院分区：
文献类型：
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作者：
J. Slaughter;D. W. Schulze;C. R. Hills;A. Mirone;R. Stalio;R. Watts;C. Tarrio;T. Lucatorto;M. Krumrey;P. Mueller;C. Falco
我们报告了通过溅射和特高压蒸发生长的Si/Mo多层膜的结构、化学和极紫外（EUV）表征结果。本研究包括为正常入射设计的反射镜，其峰值反射率在22至24 nm之间，以及45°反射镜，其峰值在16至19 nm之间。通过改变沉积条件，制备出具有多种界面形态的多层膜。研究人员使用了多种技术来确定多层膜的结构和组成，包括x射线衍射、透射电子显微镜、卢瑟福后向散射光谱和俄歇深度剖面。所有的反射镜都有非晶硅层和多晶Mo层，中间有薄的非晶合金层。只有考虑到这些夹层，我们才能得到与低角度x射线衍射数据的良好拟合。在研究的最低氩压力（3 mTorr）下制备的溅射反射镜效果最好。最好的蒸发镜是一次性生产出来的。
We report the results of structural, chemical, and extreme ultraviolet (EUV) characterization of Si/Mo multilayers grown by sputtering and by UHV evaporation. This study includes mirrors designed for normal incidence with peak reflectivities Rpeak between 22 and 24 nm, and 45° mirrors having Rpeak between 16 and 19 nm. The deposition conditions were varied to produce multilayers with a wide range of interface morphologies. A variety of techniques were used to determine the structure and composition of the multilayers, including x‐ray diffraction, transmission electron microscopy, Rutherford backscattering spectroscopy, and Auger depth profiling. All of the mirrors have amorphous Si layers and polycrystalline Mo layers with thin amorphous alloy interlayers. We obtain good fits to the low‐angle x‐ray diffraction data only when these interlayers are taken into account. The best sputter‐deposited mirrors were made at the lowest Ar pressure studied, 3 mTorr. The best evaporated mirrors were produced at a subst...