Backward diode behavior in oxygen-excessive manganite-titanate p-n junction
Backward diode behavior in oxygen-excessive manganite-titanate p-n junction
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DOI:
10.1209/0295-5075/87/57006
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发表时间:
2009-09
期刊:
影响因子:
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通讯作者:
Y. Xie;J. Sun;D. Guo;B. Shen;X. Y. Zhang
中科院分区:
文献类型:
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作者:
Y. Xie;J. Sun;D. Guo;B. Shen;X. Y. Zhang
Junctions composed of La0.9Ca0.1MnO3 film and 1 wt% Nb-doped SrTiO3 substrate were fabricated using pulsed-laser deposition technique. Several junctions were annealed in O2 flow at 900 °C for 10 hours. Studies on the current-voltage characteristics of these junctions showed that the annealed junctions exhibit strong backward diode behavior that takes place for small bias (within ±1.05 V) and gradually vanishes with increasing temperature up to 50 K. As a comparison, no backward diode behavior was observed in the unannealed junctions. The depression of leakage current is believed to be responsible for the backward diode behavior in the present junctions.