Thermal and chemical stability of hexagonal boron nitride (h-BN) nanoplatelets
Thermal and chemical stability of hexagonal boron nitride (h-BN) nanoplatelets
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DOI：
10.1016/j.vacuum.2014.11.009
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发表时间：
2015-02-01
期刊：
影响因子：
4
通讯作者：
Rebholz, Claus
中科院分区：
文献类型：
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作者：
Kostoglou, Nikolaos;Polychronopoulou, Kyriaki;Rebholz, Claus
采用热重分析(TGA)和差示扫描量热仪(DSC)相结合的方法，系统地评价了宽200~800 nm、厚30~50 nm的氮化硼小片的高温性能。X射线衍射(XRD)研究证实了材料的六方石墨化结构，傅立叶变换红外光谱(FT-IR)研究表明材料中存在与B-N键相关的振动模式。用多点Brunauer-Emmet-Teller(BET)法计算的比表面积(SSA)，在77K下通过N-2吸附/脱附测量，得到了接近23m(2)/g的比表面积。在空气流动条件下，考察了从室温(25℃)到接近1300℃的高温阻力和氧化行为。H-BN小片表现出高达1000摄氏度的高热稳定性，而它们的氧化发生在1000至1200摄氏度的温度范围内，随后形成了氧化硼(B2O3)。(C)2014爱思唯尔有限公司。保留所有权利。
High-temperature properties of boron nitride platelets (200-800 nm in width and 30-50 nm in thickness) were systematically evaluated through thermogravimetric analysis (TGA) in combination with differential scanning calorimetry (DSC). X-Ray Diffraction (XRD) studies confirmed the hexagonal graphitic-like structure of the material, while Fourier-Transform Infrared Spectroscopy (FT-IR) indicated the active vibration modes related to the B-N bond. The specific surface area (SSA), calculated by the multi-point Brunauer-Emmet-Teller (BET) method, was determined at similar to 23 m(2)/g through N-2 adsorption/desorption measurements at 77 K. Both high-temperature resistance and oxidation behavior were examined from room temperature (25 degrees C) up to similar to 1300 degrees C under air-flow conditions. The h-BN platelets demonstrated a high thermal stability of up to similar to 1000 degrees C, while their oxidation occurred in the temperature range between 1000 and 1200 degrees C, followed by the formation of boron oxide (B2O3). (C) 2014 Elsevier Ltd. All rights reserved.