Energetic surface smoothing of complex metal-oxide thin films

Energetic surface smoothing of complex metal-oxide thin films
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DOI:
10.1103/physrevlett.96.176102
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发表时间:
2006-05-05
影响因子:
8.6
通讯作者:
Patterson, BD
Patterson, BD
中科院分区:
物理与天体物理1区
文献类型:
--
作者:
Willmott, PR;Herger, R;Patterson, BD

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利用X射线反射率原位研究了脉冲激光沉积La_(1-x)Sr_xMnO_3/SrTiO_3复合金属氧化物薄膜的生长动力学,发现了一种新的能量平滑机制。低于50%的单层覆盖率,迅速插入到小直径的岛屿的高能撞击物种导致他们打破形成女儿岛。因此,这种平滑机制抑制了大直径2D岛的形成和3D生长的播种。在50%覆盖率以上,岛开始聚结,从而抑制了它们的分裂。相反,入射通量的能量被重新引导到增强的表面扩散中,这导致Δ T的有效表面温度增加约500 K。这些结果对使用这些材料制造纳米器件的最佳条件具有重要意义。
A novel energetic smoothing mechanism in the growth of complex metal-oxide thin films is reported from in situ kinetic studies of pulsed laser deposition of La1-xSrxMnO3 on SrTiO3, using x-ray reflectivity. Below 50% monolayer coverage, prompt insertion of energetic impinging species into small-diameter islands causes them to break up to form daughter islands. This smoothing mechanism therefore inhibits the formation of large-diameter 2D islands and the seeding of 3D growth. Above 50% coverage, islands begin to coalesce and their breakup is thereby suppressed. The energy of the incident flux is instead rechanneled into enhanced surface diffusion, which leads to an increase in the effective surface temperature of Delta T approximate to 500 K. These results have important implications on optimal conditions for nanoscale device fabrication using these materials.