Gate tuning of anomalous Hall effect in ferromagnetic metal SrRuO3
Gate tuning of anomalous Hall effect in ferromagnetic metal SrRuO3
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DOI:
10.1063/1.4899145
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发表时间:
2014-10-20
影响因子:
4
通讯作者:
Iwasa, Yoshihiro
中科院分区:
文献类型:
--
作者:
Shimizu, Sunao;Takahashi, Kei S.;Iwasa, Yoshihiro
The electric field effect on ferromagnetism offers a new dimension in the recent advancement of spintronics. We report on the gate control of transport properties in thin films of oxide-based ferromagnetic metal, SrRuO3. An electric double layer transistor configuration was utilized with an ionic liquid dielectric to apply a strong electric field on a SrRuO3 thin film of 5 monolayers in thickness. The application of gate voltage induced a clear electroresistance effect, despite a considerably-large initial carrier density of the order of 10(22) cm(-3). Furthermore, we found that the gate modulation of the anomalous Hall conductivity sigma(xy), which was as large as similar to +/- 40% at low temperatures, was about three times larger than that of the longitudinal conductivity sigma(xx). The variation of sigma(xy) is characterized by the power-law scaling relation with sigma(xx), which is widely observed in a bad metal regime of the charge transport. (C) 2014 AIP Publishing LLC.