Fabrication of add-drop filters based on frequency-matched microring resonators
Fabrication of add-drop filters based on frequency-matched microring resonators
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DOI：
10.1109/jlt.2006.872298
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发表时间：
2006-05-01
影响因子：
4.7
通讯作者：
Smith, Henry I.
中科院分区：
文献类型：
--
作者：
Barwicz, Tymon;Popovic, Milos A.;Smith, Henry I.
谐振器之间的频率失配显著地影响耦合谐振器滤波器（诸如高阶微带滤波器）的光谱响应。在本文中，技术允许制造的频率匹配的高折射率对比度谐振器的建议，演示和分析。主要的方法包括诱导小尺寸的变化，通过改变电子束剂量的谐振器，用于暴露在晶片上的实际谐振器或其图像上的光刻掩模，稍后用于过滤器的制造。报道了用富硅氮化硅材料制作的三阶微带滤波器，其光谐振频率匹配优于1GHz。为了实现这一点，微环区域的平均环形波导宽度。匹配到小于26 μ m的所需相对宽度偏移。此外，优化和校准程序，允许严格的尺寸控制和光滑的侧壁。一个5纳米的尺寸控制证明，侧壁粗糙度的标准偏差降低到1.6纳米以下。
Frequency mismatches between resonators significantly impact the spectral responses of coupled resonator filters, such as high-order microring filters. In this paper, techniques allowing fabrication of frequency-matched high-index-contrast resonators are proposed, demonstrated, and analyzed. The main approach consists of inducing small dimensional changes in the resonators through alteration of the electron-beam dose used to expose either the actual resonator on a wafer or its image on a lithographic mask to be later used in filter fabrication. Third-order microring filters fabricated in silicon rich silicon nitride, with optical resonator frequencies matched to better than 1 GHz, are reported. To achieve this, the average ring-waveguide widths of the microrings area. matched to within less than 26 pm of a desired relative width offset. Furthermore, optimization and calibration procedures allowing strict dimensional control and smooth sidewalls are presented. A 5-nm dimensional control is demonstrated, and the standard deviation of sidewall roughness is reduced to below 1.6 nm.