Large-area nanopatterning of self-assembled monolayers of alkanethiolates by interferometric lithography.
Large-area nanopatterning of self-assembled monolayers of alkanethiolates by interferometric lithography.
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通过干涉光刻对链烷硫醇盐自组装单层进行大面积纳米图案化。
DOI：
10.1021/la101876j
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发表时间：
2010
期刊：
影响因子：
--
通讯作者：
Adams J
中科院分区：
文献类型：
--
作者：
Adams J
我们证明，干涉光刻提供了一种快速，简单的方法来生产的图案在自组装单层（SAM）具有高分辨率超过平方厘米的地区。作为原理的证明，使用来自倍频氩离子激光器（244 nm）的光形成的双光束干涉图案用于在金上图案化甲基封端的自组装膜，促进羟基封端的吸附物的引入并产生间距为ca. 200纳米。自组装膜在Pd上的图案化首次得到证实，干涉曝光产生的表面自由能图案与金上获得的图案具有相似的特征尺寸。金纳米结构是通过将自组装膜暴露于紫外线干涉图案，然后将样品浸入巯基乙胺的乙醇溶液中形成的，巯基乙胺在暴露区域蚀刻金属基底，而未氧化的硫醇充当抗蚀剂并保护金属免于溶解。宏观扩展的金纳米线制造使用单次曝光和阵列的66 nm的金点在180 nm的中心，形成使用正交曝光在一个快速，简单的过程。暴露的寡聚（乙二醇）-终止的自组装膜的紫外光引起的光降解的蛋白质抗性的尾部基团在一个基板独立的过程。与许多利用多个步骤来控制表面结合的蛋白质图案化方法相反，该单步过程在低至0.3 J cm-2的暴露下将醛官能团引入SAM表面，显著低于硫醇头基氧化所需的暴露。虽然干涉方法依赖于连续梯度的曝光，它是可能的，以制造明确定义的蛋白质纳米结构，通过引入醛基团和去除蛋白质电阻在纳米级区域。宏观扩展，纳米结构的组件链霉亲和素形成。通过生物素化蛋白质的结合证明了图案化材料中的功能保留。
We demonstrate that interferometric lithography provides a fast, simple approach to the production of patterns in self-assembled monolayers (SAMs) with high resolution over square centimeter areas. As a proof of principle, two-beam interference patterns, formed using light from a frequency-doubled argon ion laser (244 nm), were used to pattern methyl-terminated SAMs on gold, facilitating the introduction of hydroxyl-terminated adsorbates and yielding patterns of surface free energy with a pitch of ca. 200 nm. The photopatterning of SAMs on Pd has been demonstrated for the first time, with interferometric exposure yielding patterns of surface free energy with similar features sizes to those obtained on gold. Gold nanostructures were formed by exposing SAMs to UV interference patterns and then immersing the samples in an ethanolic solution of mercaptoethylamine, which etched the metal substrate in exposed areas while unoxidized thiols acted as a resist and protected the metal from dissolution. Macroscopically extended gold nanowires were fabricated using single exposures and arrays of 66 nm gold dots at 180 nm centers were formed using orthogonal exposures in a fast, simple process. Exposure of oligo(ethylene glycol)-terminated SAMs to UV light caused photodegradation of the protein-resistant tail groups in a substrate-independent process. In contrast to many protein patterning methods, which utilize multiple steps to control surface binding, this single step process introduced aldehyde functional groups to the SAM surface at exposures as low as 0.3 J cm−2, significantly less than the exposure required for oxidation of the thiol headgroup. Although interferometric methods rely upon a continuous gradient of exposure, it was possible to fabricate well-defined protein nanostructures by the introduction of aldheyde groups and removal of protein resistance in nanoscopic regions. Macroscopically extended, nanostructured assemblies of streptavidin were formed. Retention of functionality in the patterned materials was demonstrated by binding of biotinylated proteins.