Fabrication of non-polar GaN based highly responsive and fast UV photodetector
Fabrication of non-polar GaN based highly responsive and fast UV photodetector
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DOI:
10.1063/1.4978427
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发表时间:
2017-03-06
影响因子:
4
通讯作者:
Gupta, Govind
中科院分区:
文献类型:
--
作者:
Gundimeda, Abhiram;Krishna, Shibin;Gupta, Govind
We report the fabrication of ultraviolet photodetector on non-polar (11-20), nearly stress free, Gallium Nitride (GaN) film epitaxially grown on r-plane (1-102) sapphire substrate. High crystalline film leads to the formation of two faceted triangular islands like structures on the surface. The fabricated GaN ultraviolet photodetector exhibited a high responsivity of 340 mA/W at 5V bias at room temperature which is the best performance reported for a-GaN/r-sapphire films. A detectivity of 1.24 x 10(9) Jones and noise equivalent power of 2.4 x 10(-11) WHz(-1/2) were also attained. The rise time and decay time of 280 ms and 450 ms have been calculated, respectively, which were the fastest response times reported for non-polar GaN ultraviolet photodetector. Such high performance devices substantiate that non-polar GaN can serve as an excellent photoconductive material for ultraviolet photodetector based applications.