SrSnO₃ Metal-Semiconductor Field-Effect Transistor With GHz Operation
SrSnO₃ Metal-Semiconductor Field-Effect Transistor With GHz Operation
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SrSnO™ 金属半导体场效应晶体管,工作频率 GHz
DOI:
10.1109/led.2020.3040417
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发表时间:
2021
影响因子:
4.9
通讯作者:
Koester, Steven J.
中科院分区:
文献类型:
--
作者:
Wen, Jiaxuan;Chaganti, V. R.;Truttmann, Tristan K.;Liu, Fengdeng;Jalan, Bharat;Koester, Steven J.
A SrSnO3high-frequency field-effect transistor (FET) is demonstrated. The device structure consists of a recessed Schottky-gate FET with a heavily doped cap layer. DC measurements on devices with 0.5-μm gate length and 4-μm source/drain spacing show a maximum drain current of 53 mA/mm and a maximum transconductance of 43.2 mS/mm. Radio frequency (RF) characterization reveals a cut-off frequency, fT, of 1.31 GHz (0.97 GHz) and a maximum oscillation frequency, fmax, of 3.25 (3.25) GHz, after (before) de-embedding. These results represent an important advancement in developing perovskite materials for RF applications.